TECHNICAL SKILLS
My experience and area of expertise include the design, fabrication, and characterization of functional materials (2D materials and semiconductors) for electronic and optoelectronic devices.
Cleanroom Fabrication
-
Photolithography (Suss MJB3)
-
Electron-beam lithography (Vistec VB6, Crestec CABL, Zeiss EVO SEM + Raith)
-
E-beam/thermal evaporation
-
RF magnetron sputtering
-
Reactive ion etch (AMAT centura MXP)
-
Plasma etch
-
Wet chemical etch
-
Rapid thermal anneal (Ulvac Tech. MILA 3000)
-
Wire bonding (Westbond)
Design, Data Analysis, & Instrument Control
-
Python
-
Matlab
-
C++
-
IGOR Pro
-
Origin
-
AutoCAD
-
Solidworks
-
LabVIEW
-
Microsoft office
-
CorelDRAW
Materials Characterization
-
SEM (Philips XL30) with EDX
-
AFM (Park systems, Bruker, NT-MDT)
-
X-ray diffraction (Siemens D5000, Philip X'pert MRD)
-
Thin film analyzer (Filmetrics F40)
-
Cryogenic system and probe station (attoDRY2100, Quantum Design PPMS, Scientific Magnetics, Lakeshore CPX-VF, Janis)
​
Electrical and thermoelectrical inspection
-
Quasi-DC technique by SR830/860 lock-in amplifier
-
Probe station (Signatone) with HP4156B semiconductor parameter analyzer
-
2-omega method for thermopower measurement
-
Keithley 2400, 2612B sourcemeters & 2000 multimeter
-
Keithley 6485 picoammeter, 6517A electrometer
-
SR570 and DL1211 current pre-amp
​
Optical characterization
-
Micro-Raman spectroscopy (Horiba LabRAM, Renishaw inVia)
-
UV-VIS spectrophotometer (Varian Cary 300 Bio)
-
VUV spectrophotometer
-
Fluorescence microscopy
-
Photoluminescence
-
Cathodoluminescence (Oxford MonoCL) equipped with SEM
-
Ellipsometry
​
Magnetic measurement
-
Magnetic circular dichroism (MCD), magneto-optic Kerr effect (MOKE)
-
Ecopia Hall effect measurement system

Materials Growth
-
Transparent conducting oxide AZO by RF magnetron sputtering
-
Graphene and twisted bilayer graphene by thermal CVD
-
II-VI semiconducting nanomaterials such as zinc oxide and zinc sulfide by thermal CVD
​
